| 1. Identity statement | ||||
| Reference Type | Journal Article | |||
| Site | mtc-m21c.sid.inpe.br | |||
| Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S | |||
| Identifier | 8JMKD3MGP3W34R/43QQ5HH | |||
| Repository | sid.inpe.br/mtc-m21c/2020/12.21.12.07 (restricted access) | |||
| Last Update | 2020:12.21.12.07.13 (UTC) administrator | |||
| Metadata Repository | sid.inpe.br/mtc-m21c/2020/12.21.12.07.13 | |||
| Metadata Last Update | 2022:04.03.23.14.18 (UTC) administrator | |||
| DOI | 10.1116/6.0000607 | |||
| ISSN | 0734-2101 | |||
| Citation Key | MartinsDamCorTraBar:2021:MiReSt | |||
| Title | Mitigating residual stress of high temperature CVD diamond films on vanadium carbide coated steel  | |||
| Year | 2021 | |||
| Access Date | 2024, May 09 | |||
| Type of Work | journal article | |||
| Secondary Type | PRE PI | |||
| Number of Files | 1 | |||
| Size | 5827 KiB | |||
| 2. Context | ||||
| Author | 1 Martins, Rômulo Luís 2 Damm, Djoille Denner 3 Corat, Evaldo José 4 Trava-Airoldi, Vladimir Jesus 5 Barquete, Danilo Maciel | |||
| Resume Identifier | 1 2 3 8JMKD3MGP5W/3C9JH33 | |||
| ORCID | 1 0000-0001-5749-8768 | |||
| Group | 1 2 3 COPDT-CGIP-INPE-MCTI-GOV-BR 4 COPDT-CGIP-INPE-MCTI-GOV-BR | |||
| Affiliation | 1 Universidade Estadual de Santa Cruz (UESC) 2 Universidade Federal do Recôncavo Baiano 3 Instituto Nacional de Pesquisas Espaciais (INPE) 4 Instituto Nacional de Pesquisas Espaciais (INPE) 5 Universidade Estadual de Santa Cruz (UESC) | |||
| Author e-Mail Address | 1 martinsrlf@gmail.com 2 3 evaldo.corat@inpe.br 4 vladimir.airoldi@inpe.br | |||
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | |||
| Volume | 39 | |||
| Number | 1 | |||
| Pages | e013404 | |||
| History (UTC) | 2020-12-21 12:08:22 :: simone -> administrator :: 2020 2020-12-22 09:56:34 :: administrator -> simone :: 2020 2021-01-04 12:26:33 :: simone :: 2020 -> 2021 2021-01-04 12:26:33 :: simone -> administrator :: 2021 2022-04-03 23:14:18 :: administrator -> simone :: 2021 | |||
| 3. Content and structure | ||||
| Is the master or a copy? | is the master | |||
| Content Stage | completed | |||
| Transferable | 1 | |||
| Content Type | External Contribution | |||
| Version Type | publisher | |||
| Abstract | In this work, a process condition was created to deposit a thin film of diamond on AISI O1 steel in a hot filament chemical vapor deposition (CVD) reactor. The main drawbacks to overcome are the diamond film high residual stresses caused by the difference between the coefficient of thermal expansion (CTE) of steel (∼12 × 10−6 K−1 ) and diamond (0.8 × 10−6 K−1 ). Our group proposed a diffusion vanadium carbide (VC) interlayer as a potential solution to mitigate carbon dissolution in the substrate and graphite formation instead of diamond; however, the intermediate CTE of VC still provides high thermal stress and delamination of the film. A solution was proposed by performing the diamond CVD on the AISI O1 steel substrate above the steel austenitizing temperature, under the prospect that thermal stress will be minimized during cooling, since the return of steel from faced-centered cubic to body-centered cubic crystalline structures will cause substrate expansion. The lower residual stress was accomplished by the diamond growth temperature of 840 °C with all the steel substrate above the austenitizing critical temperature. The residual stress mitigation was 3.9 GPa, merging VC interlayer and high growth temperature, where numerical simulation exposed the same stress created by the growth temperature at 545 °C. | |||
| Area | FISMAT | |||
| Arrangement | urlib.net > BDMCI > Fonds > Produção a partir de 2021 > CGIP > Mitigating residual stress... | |||
| doc Directory Content | access | |||
| source Directory Content | there are no files | |||
| agreement Directory Content |
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| 4. Conditions of access and use | ||||
| Language | en | |||
| Target File | martins_mitigating.pdf | |||
| User Group | simone | |||
| Visibility | shown | |||
| Archiving Policy | denypublisher allowfinaldraft | |||
| Read Permission | deny from all and allow from 150.163 | |||
| Update Permission | not transferred | |||
| 5. Allied materials | ||||
| Next Higher Units | 8JMKD3MGPCW/46KUES5 | |||
| Dissemination | WEBSCI; SCOPUS. | |||
| Host Collection | urlib.net/www/2017/11.22.19.04 | |||
| 6. Notes | ||||
| Empty Fields | alternatejournal archivist callnumber copyholder copyright creatorhistory descriptionlevel e-mailaddress format isbn keywords label lineage mark mirrorrepository month nextedition notes parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarykey secondarymark session shorttitle sponsor subject tertiarymark tertiarytype url | |||
| 7. Description control | ||||
| e-Mail (login) | simone | |||
| update | ||||